Ion Plasma Treatment Devices
ION-BREEZE
Ion beam diameter 100 - 400 mm
Ion energy 10 - 250 eV
Ion current density 0.5 - 6 mA/cm2
Radio Frequency Single Grid Ion Source with Self-Compensated Ion Beam
The source are designed for use in the processes of ion-beam assistance, plasma etching, cleaning, plasma-chemical etching, sputtering, etc.
E-MONSOON
Electronic current up to 1000 mA
Electron energy 5 - 50 eV
High frequency electrons sources (neutralizers)
Electrons sources (Neutralizers) are designed for use in ion-beam sputtering processes to neutralize a positive charge in the processes of ion-beam cleaning and activation, ion-beam sputtering, ion polishing, as well as independent devices for scientific and research applications.
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High-frequency power supply for plasma devices
HFP Plasma G20
High frequency generators
Working frequencies: 2; 13.56; 27.12; 40.68 MHz
Working power: 500 - 10000 W
Output impedance: 50 Ohm
Generators with absolute reliability when operating on any gas-discharge, ion-plasma load. Thanks to a unique adaptive power supply automation system, the generators can operate on a load with any VSWR and any reflection phase including x.x points. and k.z.
RF Switch
High frequency load switches and power distributors
Working power: 30 - 10000 W
High frequency load switches and power distributors are designed to switch high frequency supply voltage and direct (pulse) current between multiple receivers. The use of the switches allows to save money on the purchase of expensive high-frequency power supply systems, as well as to supply devices by different type of currents.
GLORIA MN
High frequency matching network (box)
Working frequencies: 2; 13.56; 27.12; 40.68 MHz
Working power: 30 - 10000 W
Input impedance: 50 or 75 ohms
Output impedance: as required
Designed to tune impedance of load as capacitive and inductive discharge systems such as magnetron sputtering systems, plasma sources, ion sources, plasma deposition and etching systems with impedance of high-frequency generators. The device connects between the load and power line going to the generator.
Components for vacuum technological devices
Ceramic parts
Ceramic components for vacuum processing devices
Material: Al2O3,
Application temperature up to 1650 degC
More details about the products of this series can be found by contacting our company using a convenient way of communication .
Quartz reactors
Quartz Discharge Reactors and Other Quartz Glass Products
Quartz reactors for ion sources ION-BREEZE and ION-TYPHOON series
High quality quartz glass products, for devices of our production or made according to your drawings.
More details about the products of this series can be found by contacting our company using a convenient way of communication .
Ion optical systems
Ion-optical systems (IOS) for ion sources
Aperture diameter: 100, 140, 200, 250, 300 mm;
Material: molybdenum, titanium, tantalum, graphite;
Focal length: -100 - +100 mm;
Ion-optical systems (IOS) for ion sources ION-BREEZE and ION-TYPHOON.
Manufacturing of IOS with one or several focal lengths, from titanium, molybdenum, tantalum.
More details about the products of this series can be found by contacting our company using a convenient way of communication .
Vacuum and air capacitors
Variable and constant high frequency capacitors
Working power: 30 W - 1000 kW
Variable and permanent vacuum ceramic capacitors.
Capacities range from tens to thousands of pico Farads. Working voltage from 1.5 kV to 45 kV.
Operating current from 15 to 1000 A.
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More details about the products of this series can be found by contacting our company using a convenient way of communication .