High frequency inductively coupled plasma source (ICPs) for direct and remote plasma processing
High frequency inductively coupled plasma source (ICPs) for direct and remote plasma processing
PLASMA CALM
Induction coupled plasma sources for direct and remote plasma treatment
Description
Source is possible to use in plasma and plasma-chemical processes in optics and semiconductor production.
It is provides generation of low-temperature low-pressure high density gas-discharge plasma in the range of 0.05–100 Pa, with an electron concentration of 10E10–10E12 cm-3 and a degree of ionization up to 3%.
There is a source with an inductive coupled source with a low-resistance flat multi-pass spiral antenna system.
Main advantages
- Low energies of electrons and ions (Te <5 eV; Ti <0.15 eV);
- High degree of ionization, exceeding 3%;
- Built-in automatic matching network (box).