Automatic matching network for inductively coupled plasma and capacitively coupled plasma loads operating at a frequency of 13.56 MHz from 30 to 3000 W
Automatic matching network for inductively coupled plasma and capacitively coupled plasma loads operating at a frequency of 13.56 MHz from 3 to 300 W
Matching network for inductively coupled plasma and capacitively coupled plasma loads operating at a frequency of 500 kHz from 1500 to 150000 W
Automatic matching network for inductively coupled plasma and capacitively coupled plasma loads operating at a frequency of 13.56 MHz from 30 to 3000 W
GLORIA
High frequency matching network (box)
Main advantages
- Fully automatic and autonomous impedance matching algorithm;
- High speed of automatic impedance matching;
- Simple configuration via a personal computer or industrial controller;
- Supply 110-220 V, without additional converters.
Overview
Designed to tune impedance of load as capacitive and inductive discharge systems such as magnetron sputtering systems, plasma sources, ion sources, plasma deposition and etching systems with impedance of high-frequency generators. The device connects between the load and power line going to the generator.
In the matching device, the load impedance tune due to the use in the circuit T- or Pi- network on reactive elements.
If necessary, the matching device can be equipped with a switch module for connect the load to the DC or HF voltage. For example, to switch the magnetron sputtering system between DC and RF without manual switches by hand.