ION TYPHOON
High Frequency Grided Ion Sources
Description
Sources are designed for use in the processes of ion-beam cleaning and activation, ion-assisting, ion-beam sputtering, and ion milling.
Provides the generation of a monoenergetic ion beam with an ion current density of 0.5-5 mA / cm2 and an ion energy of 150-1500 eV.
There is a ion source with a two- or three-grids ion-optical system based on a high-frequency inductive coupled discharge. Depends on configuration of the ion-optical system the source are forming a diverging (defocused), parallel (collimated), converging (focused) ion beam.
Main advantages
- Built-in impedance matching network (M’Box).
- Convergent, collimated and divergent ion beam by request.
- Easy control by communication port.
- High density of ion current.
- Ion flux without contaminations.
- Long lifetime, easy maintenance.
- Full set of power supplies available including automatic controller.